Helmut Beierl
24Patents
11h-index
29Co-inventors
71Inventor score
Filing activity: Jul 29, 1999 → Mar 5, 2013
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6349005B1 | Microlithographic reduction objective, projection exposure equipment and process | Physics | 45 | Expired |
| US7187503B2 | Refractive projection objective for immersion lithography | Physics | 39 | Expired |
| US6496306B1 | Catadioptric optical system and exposure apparatus having the same | Physics | 38 | Expired |
| US6665126B2 | Projection exposure lens with aspheric elements | Physics | 37 | Expired |
| US6646718B2 | Projection objective having adjacently mounted aspheric lens surfaces | Physics | 30 | Expired |
| US6424471B1 | Catadioptric objective with physical beam splitter | Physics | 26 | Expired |
| US6995930B2 | Catadioptric projection objective with geometric beam splitting | Physics | 23 | Expired |
| US6806942B2 | Projection exposure system | Physics | 22 | Expired |
| US7136220B2 | Catadioptric reduction lens | Physics | 18 | Expired |
| US7006304B2 | Catadioptric reduction lens | Physics | 18 | Expired |
| US7426082B2 | Catadioptric projection objective with geometric beam splitting | Physics | 14 | Expired |
| US6717746B2 | Catadioptric reduction lens | Physics | 11 | Expired |
| US6717722B2 | Catadioptric optical system and exposure apparatus having the same | Physics | 6 | Expired |
| US7782440B2 | Projection lens system of a microlithographic projection exposure installation | Physics | 4 | Active |
| US9146475B2 | Projection exposure system and projection exposure method | Physics | 3 | Active |
| US6985286B2 | Catadioptric optical system and exposure apparatus having the same | Physics | 2 | Expired |
| US8319944B2 | Projection lens system of a microlithographic projection exposure installation | Physics | 1 | Active |
| US7408716B2 | Refractive projection objective for immersion lithography | Physics | 1 | Active |
| US6903802B2 | Projection objective having adjacently mounted aspheric lens surfaces | Physics | 1 | Expired |
| US8107054B2 | Microlithographic projection exposure apparatus | Physics | 0 | Active |
| US8436982B2 | Projection objective for microlithography | Physics | 0 | Active |
| US8982325B2 | Microlithographic projection exposure apparatus | Physics | 0 | Active |
| US7154678B2 | Projection objective having adjacently mounted aspheric lens surfaces | Physics | 0 | Expired |
| US9164396B2 | Projection lens system of a microlithographic projection exposure installation | Physics | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.