Patent · US Expired

Radiation source, lithographic apparatus, device manufacturing method, and device manufactured thereby

US6667484B2 · kind B2 · utility

4Cited by
3References
20Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJun 28, 2001
Grant dateDec 23, 2003
Priority date
Expiry dateFeb 21, 2022

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH05G2/0035
  • WIPO fieldMedical technology
  • WIPO sectorInstruments

Abstract

A radiation source includes an anode and a cathode for creating a discharge in a vapor in a space between anode and cathode and to form a plasma of a working vapor so as to generate electromagnetic radiation. The cathode defines a hollow cavity in communication with the discharge region through an aperture that has a substantially annular configuration around a central axis of said radiation source so as to initiate said discharge. A driver vapor is supplied to the cathode cavity and the working vapor is supplied in a region around the central axis in between anode and cathode.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.