Linear drive system for use in a plasma processing system
US6669811B2 · kind B2 · utility
9Cited by
18References
24Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Nov 5, 2001 |
| Grant date | Dec 30, 2003 |
| Priority date | — |
| Expiry date | Nov 28, 2021 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/32568
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A plasma processing system for processing a substrate is disclosed. The system includes a process component capable of effecting a plasma inside a process chamber. The system also includes a gear drive assembly for moving the process component in a linear direction during processing of the substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.