Coating method and coating apparatus
US6670287B2 · kind B2 · utility
3Cited by
13References
16Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 22, 2002 |
| Grant date | Dec 30, 2003 |
| Priority date | — |
| Expiry date | May 22, 2022 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB05D3/068
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A closed space is formed in a reduced pressure drying station, and the closed space is brought to a vacuum state. In this state, an EB unit irradiates a wafer mounted on a hot plate with an electron beam to foam an insulating film material. Subsequently, the hot plate is raised to a predetermined temperature, and drying processing is performed under a reduced pressure. As described above, since the foaming processing is performed in the reduced pressure drying station, bubbles remain in the insulating film, so that the existence of the bubbles can decrease the relative dielectric constant.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.