System and method for directing a miller
US6670610B2 · kind B2 · utility
40Cited by
6References
83Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Nov 26, 2001 |
| Grant date | Dec 30, 2003 |
| Priority date | — |
| Expiry date | Nov 26, 2021 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/28
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A system and method for directing the object, such as a semiconductor die. The system includes a first images such as a scanning electron microscope, a stage for moving the object and a second imager and miller such as a focused ion beam generator. The object is images to locate a desired location in which the object is to be milled and a landmark that is utilized for directing the miller. The system can include additional steps of milling, analyzing and movement of the object.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.