Optical system and method for plasma optical emission analysis
US6677604B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Mar 14, 2002 |
| Grant date | Jan 13, 2004 |
| Priority date | — |
| Expiry date | Mar 14, 2022 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N21/68
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
An apparatus (10) and method for detecting and analyzing the spectra of light emitted by a plasma (36) in a plasma duct (16) having a plurality of windows (40) formed therein. In one embodiment, the apparatus includes an optical system (50) arranged adjacent each window that directs light emanating from the plasma and passing through each window to two or more optical filters (F1, F2) having different bandwidths so that different portions of the light spectra (S1, S2) can be measured. The filter light is incident respective two or more detectors (D1, D2), which produce an electrical signal representative of the intensity of light incident thereon, and thus is a measure of the content of a select band of the light spectrum. Performing this measurement for different regions (R) of the plasma yields different spectra and thus provides information about the plasma properties, thereby allowing for adjustment of those properties. The adjustment can be made by selectively providing electrical power to electrodes (E) formed in the plasma duct and in operable communication with the plasma. Other embodiments of the apparatus are disclosed that involve a translatable optical system and fiber …
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.