Andrej Mitrovic
33Patents
11h-index
25Co-inventors
75Inventor score
Filing activity: Oct 24, 2001 → Oct 25, 2022
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6863020B2 | Segmented electrode apparatus for plasma processing | Electricity | 70 | Expired |
| US7164236B2 | Method and apparatus for improved plasma processing uniformity | Electricity | 55 | Expired |
| US6962664B2 | Controlled method for segmented electrode apparatus and method for plasma processing | Electricity | 50 | Expired |
| US6917204B2 | Addition of power at selected harmonics of plasma processor drive frequency | Electricity | 49 | Expired |
| US7075031B2 | Method of and structure for controlling electrode temperature | Electricity | 33 | Expired |
| US7591923B2 | Apparatus and method for use of optical system with a plasma processing system | Electricity | 25 | Expired |
| US6806653B2 | Method and structure to segment RF coupling to silicon electrode | Electricity | 19 | Expired |
| US6958484B2 | Method and apparatus for 2-d spatially resolved optical emission and absorption spectroscopy | Electricity | 16 | Expired |
| US6812646B2 | Method and device for attenuating harmonics in semiconductor plasma processing systems | Electricity | 14 | Expired |
| US7241397B2 | Honeycomb optical window deposition shield and method for a plasma processing system | Electricity | 13 | Expired |
| US8014991B2 | System and method for using first-principles simulation to characterize a semiconductor manufacturing process | Emerging Cross-Sectional Technologies | 12 | Expired |
| US8296687B2 | System and method for using first-principles simulation to analyze a process performed by a semiconductor processing tool | Emerging Cross-Sectional Technologies | 8 | Active |
| US6677604B2 | Optical system and method for plasma optical emission analysis | Physics | 8 | Expired |
| US8073667B2 | System and method for using first-principles simulation to control a semiconductor manufacturing process | Physics | 8 | Expired |
| US8050900B2 | System and method for using first-principles simulation to provide virtual sensors that facilitate a semiconductor manufacturing process | Emerging Cross-Sectional Technologies | 8 | Active |
| US8032348B2 | System and method for using first-principles simulation to facilitate a semiconductor manufacturing process | Physics | 7 | Expired |
| US6700458B2 | Device and method for coupling two circuit components which have different impedances | Electricity | 6 | Expired |
| US6824363B2 | Linear inductive plasma pump for process reactors | Electricity | 6 | Expired |
| US8036869B2 | System and method for using first-principles simulation to control a semiconductor manufacturing process via a simulation result or a derived empirical model | Emerging Cross-Sectional Technologies | 5 | Expired |
| US7015414B2 | Method and apparatus for determining plasma impedance | Electricity | 5 | Expired |
| US6899527B2 | Closed-drift hall effect plasma vacuum pump for process reactors | Electricity | 5 | Expired |
| US7020583B2 | Method and apparatus for determining chemistry of part's residual contamination | Electricity | 3 | Expired |
| US7109788B2 | Apparatus and method of improving impedance matching between an RF signal and a multi- segmented electrode | Electricity | 3 | Expired |
| US6729850B2 | Applied plasma duct system | Electricity | 3 | Expired |
| US7233878B2 | Method and system for monitoring component consumption | Electricity | 3 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.