Apparatus for cleaning an exhaust line in a semiconductor processing system
US6680420B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Dec 4, 2000 |
| Grant date | Jan 20, 2004 |
| Priority date | — |
| Expiry date | Mar 6, 2021 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02P70/50
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
An apparatus for preventing particulate matter and residue build-up within a vacuum exhaust line of a semiconductor processing device. The apparatus uses RF energy to excite the constituents of particulate matter exhausted from a semiconductor processing chamber into a plasma state such that the constituents react to form gaseous products that may be pumped through the vacuum line. The apparatus may include a collection chamber structured and arranged to collect particulate matter flowing through the apparatus and inhibiting egress of the particulate matter from the apparatus. The apparatus may further include an electrostatic collector to enhance particle collection in the collection chamber and to further inhibit egress of the particulate matter.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.