Through-the-lens neutralization for charged particle beam system
US6683320B2 · kind B2 · utility
17Cited by
16References
22Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 16, 2001 |
| Grant date | Jan 27, 2004 |
| Priority date | — |
| Expiry date | Jun 2, 2021 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/244
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
An electron source provides electrons that are directed through the final lens of an ion optical column to neutralize at least a portion of the accumulated charge on a sample. The invention can optionally be combined with collection of secondary electrons through the final ion lens. A deflector directs the neutralizing electrons onto the ion beam optical axis and deflects the secondary electrons away from the optical axis for detection. For imaging, a high-pass energy filter separates secondary electrons generated from the neutralizing electron beam from secondary electrons generated by the ion beam.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.