Apparatus for generating inductively coupled plasma
US6685800B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Nov 14, 2001 |
| Grant date | Feb 3, 2004 |
| Priority date | — |
| Expiry date | Nov 14, 2021 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/321
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
Disclosed is an apparatus for generating ICP, which has a heater having a hot wire as a heating source for heating elements in a chamber and inner wall of the chamber and also efficiently transfers heat of the heater through a heat transferring gas to the elements in the chamber and the inner wall of the chamber. According to the present invention, the elements in the chamber and the inner wall of the chamber can be heated up to a temperature of about 200° C., thereby reducing the adhesion of the by-product served as the source generating the undesirable particles. In addition, since the hot wire having a longer life span than the halogen lamp is used as heat radiating means, the life span of the apparatus is also increased.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.