Ion sources for ion implantation apparatus
US6686601B2 · kind B2 · utility
11Cited by
10References
23Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 2, 2002 |
| Grant date | Feb 3, 2004 |
| Priority date | — |
| Expiry date | Dec 2, 2022 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/3171
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
The invention relates to an ion source for an ion implanter in which source material for providing desired ions is provided in the form of a plate or liner which can be fitted into the reactant chamber of the ion source.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.