Photoresist composition containing photo radical generator with photoacid generator
US6692891B2 · kind B2 · utility
11Cited by
5References
13Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 12, 2001 |
| Grant date | Feb 17, 2004 |
| Priority date | — |
| Expiry date | Aug 23, 2021 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/126
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The present invention relates to a photoresist composition containing a photo radical generator, more specifically, to a photoresist composition which comprises (a) photoresist resin, (b) a photoacid generator, (c) an organic solvent and (d) a photo radical generator. The present photoresist composition reduces or prevents a sloping pattern formation due to a higher concentration of acid in the upper portion of the photoresist relative to the lower portion of the photoresist.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.