Wave surface aberration measurement device, wave surface aberration measurement method, and projection lens fabricated by the device and the method
US6693704B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Sep 26, 2000 |
| Grant date | Feb 17, 2004 |
| Priority date | — |
| Expiry date | Aug 27, 2021 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01J9/00
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A method and apparatus for measuring a wave front aberration of a projection lens with high precision and a related calibration method. The apparatus includes: either a light source and an element producing a first point source in combination with the light source or a first point source generating part; a magnifying projection optical system projecting and magnifying a point image of the first point source projected by a test object; a detector detecting the magnified point image projected and magnified by the magnifying projection optical system; a supporting member supporting the magnifying projection optical system and the detector; a calculating part calculating a wave front aberration; and either a second point source producing element or a second point source generating part.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.