Lithography mask configuration
US6696206B2 · kind B2 · utility
0Cited by
2References
3Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Oct 17, 2001 |
| Grant date | Feb 24, 2004 |
| Priority date | — |
| Expiry date | Mar 22, 2022 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70783
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A reflective membrane mask is composed at least partially of an electrically conductive material and is aligned horizontally over a sample to be processed. Bending of the reflective membrane mask is compensated for by disposing an electrode plate above the membrane mask and parallel to it, which electrode plate is provided with a number of electrodes that are electrically isolated from one another. Electrostatic forces, that correct for any deformation of the membrane mask, are produced by applying an electrical potential difference between each electrode and the membrane mask.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.