Albrecht Ehrmann
20Patents
5h-index
38Co-inventors
65Inventor score
Filing activity: Oct 17, 2001 → Aug 30, 2019
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6835508B2 | Large-area membrane mask and method for fabricating the mask | Physics | 29 | Expired |
| US7760366B2 | System for measuring the image quality of an optical imaging system | Emerging Cross-Sectional Technologies | 25 | Active |
| US6696371B2 | Method for fabricating positionally exact surface-wide membrane masks | Emerging Cross-Sectional Technologies | 23 | Expired |
| US7796274B2 | System for measuring the image quality of an optical imaging system | Emerging Cross-Sectional Technologies | 18 | Expired |
| US7408652B2 | Device and method for the optical measurement of an optical system by using an immersion fluid | Physics | 7 | Expired |
| US6748879B2 | Goods transfer station and process for operating such a goods transfer station | Fixed Constructions | 4 | Expired |
| US10006807B2 | Apparatus for determining an optical property of an optical imaging system | Physics | 3 | Active |
| US8330935B2 | Exposure apparatus and measuring device for a projection lens | Physics | 2 | Active |
| US6773854B2 | Method of producing a perforated mask for particle radiation | Electricity | 2 | Expired |
| US6864182B2 | Method of producing large-area membrane masks by dry etching | Emerging Cross-Sectional Technologies | 1 | Expired |
| US9436095B2 | Exposure apparatus and measuring device for a projection lens | Physics | 1 | Active |
| US8488127B2 | System for measuring the image quality of an optical imaging system | Emerging Cross-Sectional Technologies | 1 | Active |
| US8212991B2 | Optical system of a microlithographic projection exposure apparatus | Physics | 1 | Active |
| US8120763B2 | Device and method for the optical measurement of an optical system by using an immersion fluid | Physics | 0 | Active |
| US9429495B2 | System for measuring the image quality of an optical imaging system | Emerging Cross-Sectional Technologies | 0 | Active |
| US6696206B2 | Lithography mask configuration | Physics | 0 | Expired |
| US8823948B2 | System for measuring the image quality of an optical imaging system | Emerging Cross-Sectional Technologies | 0 | Active |
| US10345710B2 | Microlithographic projection exposure apparatus and measuring device for a projection lens | Physics | 0 | Active |
| US8836929B2 | Device and method for the optical measurement of an optical system by using an immersion fluid | Physics | 0 | Active |
| US11441970B2 | Measurement apparatus for measuring a wavefront aberration of an imaging optical system | Physics | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.