Anti-fuse memory cell with asymmetric breakdown voltage
US6704235B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Dec 20, 2001 |
| Grant date | Mar 9, 2004 |
| Priority date | — |
| Expiry date | Jan 9, 2022 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L2924/0002
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
A memory cell for a two- or a three-dimensional memory array includes first and second conductors and set of layers situated between the conductors. This set of layers includes a dielectric rupture anti-fuse layer having a thickness less than 35 å and a leakage current density (in the unruptured state) greater than 1 mA/cm2 at 2 V. This low thickness and high current leakage density provide a memory cell with an asymmetric dielectric layer breakdown voltage characteristic. The antifuse layer is formed of an antifuse material characterized by a thickness Tminlife at which the antifuse material is ruptured by a minimum number of write pulses having a polarity that reverse biases diode components included in the memory cell. The average thickness T of the antifuse layer is less than the thickness Tminlife.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.