Interactive optical proximity correction design method
US6704695B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Jul 16, 1999 |
| Grant date | Mar 9, 2004 |
| Priority date | — |
| Expiry date | Jul 16, 2019 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F1/36
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method and structure for creating a photomask data set includes inputting a design data set, creating a simulated printed data set by applying a lithography simulation model to chosen levels of the design data set, merging each chosen level of the design data set with each corresponding level of the simulated printed data set in order to produce a merged design data set, applying at least one test to the merged design data set, correcting the design data set based on results of the test to produce a corrected design data set, repeating the creating of the simulated printed data, merging, applying the test and correcting using the corrected design data set until the corrected design data set passes the test, and outputting the corrected design data set as the photomask data set.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.