Multirate processing for metrology of plasma RF source
US6707255B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jul 10, 2002 |
| Grant date | Mar 16, 2004 |
| Priority date | — |
| Expiry date | Jul 10, 2022 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/32174
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
An RF generator is provided for use in an RF plasma system. The RF generator includes: a power source that is operable to generate RF power signals at a tuned frequency; a sensor unit that is adapted to detect the RF power signals and operable to generate analog signals representative of the RF power signals, where the analog signals include a frequency of interest and a plurality of interfering frequency components; and a sensor signal processing unit that is adapted to receive the analog signals from the sensor unit and to band limit the analog signals within a predefined bandwidth that passes the frequency of interest and rejects interfering frequency components.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.