Michael L. Kirk
3Patents
3h-index
4Co-inventors
43Inventor score
Filing activity: Jul 10, 2002 → Apr 10, 2014
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6707255B2 | Multirate processing for metrology of plasma RF source | Electricity | 38 | Expired |
| US6983215B2 | RF metrology characterization for field installation and serviceability for the plasma processing industry | Electricity | 34 | Expired |
| US9336995B2 | Multiple radio frequency power supply control of frequency and phase | Electricity | 13 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.