EUV mirror based absolute incident flux detector
US6710351B2 · kind B2 · utility
7Cited by
12References
32Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Sep 18, 2001 |
| Grant date | Mar 23, 2004 |
| Priority date | — |
| Expiry date | Feb 23, 2022 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG21K1/062
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A device for the in-situ monitoring of EUV radiation flux includes an integrated reflective multilayer stack. This device operates on the principle that a finite amount of in-band EUV radiation is transmitted through the entire multilayer stack. This device offers improvements over existing vacuum photo-detector devices since its calibration does not change with surface contamination.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.