Patent · US Expired

Method for calibrating a lithographic projection apparatus and apparatus capable of applying such a method

US6710849B2 · kind B2 · utility

52Cited by

2References

10Claims

0Family size

Assignee

ASML NETHERLANDS B.V. · NL

Inventors

Yim-Bun Patrick Kwan · Aalen, DE
Leon Martin Levasier · Hedel, NL

Key dates

Filing date	Sep 4, 2001
Grant date	Mar 23, 2004
Priority date	—
Expiry date	Dec 6, 2021

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/7075
WIPO fieldOptics
WIPO sectorInstruments

Abstract

A method for calibrating a lithographic projection apparatus includes identifying a set of two or more reference positions of one a first and a second object table WTa, WTb or MT with a first detection system and simultaneously measuring those reference positions with a first position measuring system, identifying the same set of reference positions of said one object table with a second detection system and simultaneously measuring those reference positions with a second position measuring system, and correlating said first and said second position measuring systems using the measurements of the reference positions.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.