Exposure apparatus, method for manufacturing thereof and method for manufacturing microdevice
US6717651B2 · kind B2 · utility
13Cited by
15References
49Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Apr 10, 2001 |
| Grant date | Apr 6, 2004 |
| Priority date | — |
| Expiry date | Apr 10, 2021 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03B27/52
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An exposure apparatus exposes a transfer pattern of a mask onto a photosensitive substrate in an overlapping manner. The exposure apparatus includes an illumination optical system for guiding illumination light to the mask. An imaging optical system in the illumination optical system forms an illumination area on the mask. The exposure apparatus includes a lens driving apparatus. The lens driving apparatus moves at least one of the lenses constituting the imaging optical system along the optical axis and so forth, thereby correcting an optical characteristic of the imaging optical system.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.