Metrology hardware specification using a hardware simulator
US6721691B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 26, 2002 |
| Grant date | Apr 13, 2004 |
| Priority date | — |
| Expiry date | Mar 26, 2022 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70516
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A method and system in metrology for integrated circuits, for incorporating the effects of small metrology hardware-based and material-based parameter variations into a library of simulated diffraction spectra. In a first embodiment, a method is disclosed for determining metrology hardware specification ranges that correspond to specified CD measurement accuracy. In a second embodiment, a method for modifying a library of simulated diffraction spectra for optimization to the particular parameters of a specific piece of metrology hardware and specific material batches is disclosed.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.