Inventor · Los Altos, CA, US

Junwei Bao

130Patents
14h-index
83Co-inventors
89Inventor score

Filing activity: Jun 13, 2001 → Jul 18, 2023

Most-cited inventions

PatentTitleAreaCited byStatus
US6721691B2 Metrology hardware specification using a hardware simulator Physics 84 Expired
US10969475B2 Method and system for encoding and decoding LiDAR Physics 80 Active
US11009605B2 MEMS beam steering and fisheye receiving lens for LiDAR system Physics 66 Active
US6609086B1 Profile refinement for integrated circuit metrology Physics 54 Expired
US7126700B2 Parametric optimization of optical metrology model Physics 34 Expired
US7330279B2 Model and parameter selection for optical metrology Physics 33 Expired
US7280229B2 Examining a structure formed on a semiconductor wafer using machine learning systems Physics 31 Expired
US7064829B2 Generic interface for an optical metrology system Physics 28 Expired
US7171284B2 Optical metrology model optimization based on goals Physics 27 Expired
US7831528B2 Optical metrology of structures formed on semiconductor wafers using machine learning systems Physics 24 Active
US6775015B2 Optical metrology of single features Physics 24 Expired
US6597463B1 System to determine suitability of sion arc surface for DUV resist patterning Physics 18 Expired
US7388677B2 Optical metrology optimization for repetitive structures Physics 16 Expired
US11054508B2 High resolution LiDAR using high frequency pulse firing Physics 14 Active
US7372583B1 Controlling a fabrication tool using support vector machine Physics 13 Active
US7216045B2 Selection of wavelengths for integrated circuit optical metrology Physics 12 Expired
US7136796B2 Generation and use of integrated circuit profile-based simulation information Physics 12 Expired
US10942257B2 2D scanning high precision LiDAR using combination of rotating concave mirror and beam steering devices Physics 12 Active
US7467064B2 Transforming metrology data from a semiconductor treatment system using multivariate analysis Physics 11 Active
US7474420B2 In-die optical metrology Physics 10 Active
US7302367B2 Library accuracy enhancement and evaluation Physics 10 Expired
US7355728B2 Optical metrology model optimization for repetitive structures Physics 10 Expired
US6853942B2 Metrology hardware adaptation with universal library Physics 9 Expired
US7783669B2 Data flow management in generating profile models used in optical metrology Physics 9 Active
US7567352B2 Controlling a fabrication tool using support vector machine Physics 8 Active

Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.