Apparatus for rapidly measuring angle-dependent diffraction effects on finely patterned surfaces

US6724475B2 · kind B2 · utility

Assignee

• Infineon Technologies AG · DE

Inventors

• Norbert Benesch · Heroldsberg, DE
• Claus Schneider · Burgsinn, DE
• Lothar Pfitzner · Erlangen, DE

Key dates

• Filing date: Oct 1, 2001
• Grant date: Apr 20, 2004
• Expiry date: Oct 1, 2021

Classification

• Technology area (CPC G): Physics
• CPC primary: G01N21/4788
• WIPO field: Measurement
• WIPO sector: Instruments

Abstract

An apparatus for measuring angle-dependent diffraction effects includes a coherent radiation source, a device for deflecting the coherent radiation in different directions, a spherical or aspherical mirror or mirror segments configured to correspond to a spherical or aspherical mirror, and a detector unit for measuring the intensity of the radiation diffracted at a specimen. The radiation deflected in different directions is reflected by the mirror configuration in such a way that the coherent beam is deflected onto the specimen with different angles of incidence in a temporally successively sequential manner. For this purpose, the angle of incidence of the measuring beam is altered continuously or in small steps. The intensities of the direct reflection (zero-order diffraction) and also of the higher orders of diffraction that may occur are measured. This evaluation allows conclusions to be drawn regarding the form and material of the periodic structures examined.