Cleaning nozzle and substrate cleaning apparatus
US6729561B2 · kind B2 · utility
82Cited by
5References
23Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 11, 2001 |
| Grant date | May 4, 2004 |
| Priority date | — |
| Expiry date | Mar 2, 2022 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S239/08
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
A cleaning nozzle includes a mixing portion with inner walls thereof formed of quartz given smoothing treatment. As a result, the inner walls of the mixing portion have smooth surfaces. This construction effectively suppresses abrasion of the inner walls of the mixing portion, and particle generation from the cleaning nozzle. Further, the cleaning nozzle has a supply pipe surrounding a gas introduction pipe. This reduces areas of contact in the mixing portion between a gas and inner walls of the cleaning nozzle, to suppress particle generation with increased effect.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.