Novolak resin, production process thereof and positive photoresist composition using the novolak resin
US6730769B2 · kind B2 · utility
1Cited by
1References
9Claims
0Family size
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Key dates
| Filing date | May 1, 2002 |
| Grant date | May 4, 2004 |
| Priority date | — |
| Expiry date | May 1, 2022 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC08L61/06
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
(i) As a primary reaction, m-cresol is allowed to react with propionaldehyde in the presence of an acid catalyst and thereby yields a polymer having a weight average molecular weight Mw of 200 to 500 and a molecular weight distribution Mw/Mn of 1.7 or less, and (ii) as a secondary reaction, the polymer is allowed to react with 3,4-xylenol and formaldehyde and thereby yields a novolak resin having an Mw of 1000 to 20000. By adding a specific photosensitizer, the novolak resin yields a positive photoresist composition.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.