System and method for point of use delivery, control and mixing chemical and slurry for CMP/cleaning system
US6732017B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Feb 15, 2002 |
| Grant date | May 4, 2004 |
| Priority date | — |
| Expiry date | May 5, 2022 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG05D11/132
- WIPO fieldControl
- WIPO sectorInstruments
Abstract
A chemical mechanical planarization (CMP) system includes a point of use chemical mixing system. The point of use chemical mixing system includes a first and a second pump, a first and a second flow sensor, a mixer and a controller. The first pump has an input coupled to a first chemical supply and the first flow sensor coupled to the output of the first pump. The second pump has an input coupled to a second chemical supply and the second flow sensor coupled to the output of the second pump. The mixer has inputs coupled to the output of the first and second flow sensors. The controller is configured to receive signals from the first and second flow sensors and to produce control signals for the first and second pumps and the mixer. The controller is further configured to cause a mixture of the first and second chemicals upon a demand from the CMP process.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.