Patent · US Expired

Apparatus and method for removing photomask contamination and controlling electrostatic discharge

US6734443B2 · kind B2 · utility

11Cited by
18References
29Claims
0Family size

Assignee

Inventors

Key dates

Filing dateMay 8, 2001
Grant dateMay 11, 2004
Priority date—
Expiry dateJun 4, 2022

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG03F7/70983
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

A method and apparatus to remove contamination and control electrostatic discharge in-situ in a semiconductor device manufacture process. In an embodiment, the method includes providing a reticle having first and second planar surfaces into a chamber. A circuit pattern of opaque material may be disposed on the first planar surface of the reticle. The method further includes irradiating the reticle using an ultraviolet light radiation beam to remove contamination disposed on the first and second planar surfaces of the reticle and to neutralize static electricity accumulated by the reticle.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.