Rotary vacuum-chuck with venturi formed at base of rotating shaft
US6736408B2 · kind B2 · utility
15Cited by
18References
38Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 25, 2002 |
| Grant date | May 18, 2004 |
| Priority date | — |
| Expiry date | Jan 25, 2022 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T279/11
- WIPO fieldMachine tools
- WIPO sectorMechanical engineering
Abstract
In a first aspect, a rotary vacuum-chuck is provided that may hold a substrate such as a silicon wafer for rotation. The vacuum-chuck includes a hollow rotary shaft and a chuck mounted on the hollow rotary shaft and having a surface adapted to support a substrate. The chuck has one or more openings in fluid communication with the hollow rotary shaft. A venturi is formed near an end of the hollow rotary shaft to apply vacuum to the hollow rotary shaft and the openings in the chuck surface. No seal is required between the end of the hollow rotary shaft and a surrounding stationary block.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.