Thermal processor with gas supply
US6736636B2 · kind B2 · utility
3Cited by
9References
14Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Jun 18, 2001 |
| Grant date | May 18, 2004 |
| Priority date | — |
| Expiry date | Jun 18, 2021 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T137/86348
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A thermal processing unit of the invention includes a processing container that can contain an object to be processed therein, the processing container having a lower end provided with an opening. The opening is opened and closed by a lid. A flange is provided at a peripheral portion of the opening, and a gas-supplying unit is provided at the flange for supplying a gas into the processing container. A heating mechanism can heat the object to be processed contained in the processing container.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.