Vapor delivery system for solid precursors and method of using same
US6740586B1 · kind B1 · utility
16Cited by
13References
49Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Nov 6, 2002 |
| Grant date | May 25, 2004 |
| Priority date | — |
| Expiry date | Nov 18, 2022 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/28556
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
A vaporizer delivery system including a sublimatable solid precursor material applied to a wire substrate for vaporizing and achieving a continuous uninterrupted delivery of a vaporized precursor to a downstream semiconductor process chamber. The coated wire substrate is drawn past a heat source at a predetermined speed to rapidly heat and vaporize the sublimatable solid precursor.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.