Amine compounds, resist compositions and patterning process
US6743564B2 · kind B2 · utility
19Cited by
7References
27Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 6, 2001 |
| Grant date | Jun 1, 2004 |
| Priority date | — |
| Expiry date | Jul 8, 2022 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/115
- WIPO fieldOrganic fine chemistry
- WIPO sectorChemistry
Abstract
Amine compounds having a cyano group are useful in resist compositions for preventing a resist film from thinning and also for enhancing the resolution and focus margin of resist.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.