Patent · US Expired

Methods and apparatus for machine vision inspection using single and multiple templates or patterns

US6748104B1 · kind B1 · utility

43Cited by
239References
11Claims
0Family size

Assignee

Inventors

Key dates

Filing dateMar 24, 2000
Grant dateJun 8, 2004
Priority date
Expiry dateMar 24, 2020

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG06T2207/30148
  • WIPO fieldComputer technology
  • WIPO sectorElectrical engineering

Abstract

A method for rapid determination of the position and/or orientation of a semiconductor device, electronic component or other object includes performing multiple times an operation of matching a pattern against an image. The matching operation finds the location, if any, of a respective pattern in the image and determines the degree of match. The position and orientation of the object is determined from the results of one of the matching operations, for example, from the operation that revealed the highest degree of match.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.