Semiconductor run-to-run control system with state and model parameter estimation
US6748280B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Jun 14, 2002 |
| Grant date | Jun 8, 2004 |
| Priority date | — |
| Expiry date | Jun 14, 2022 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG05B17/02
- WIPO fieldControl
- WIPO sectorInstruments
Abstract
A method for a run-to-run (R2R) control system includes processing materials using a process input and producing a process output, storing the process input in a database, the storing including using a timestamp, and storing at least one measurement of the process output in the database aligned with each process input using the timestamp. The method further includes iterating over the data in the database to estimate one or more coefficients for a model, and, if one or more measurements is missing, replacing the missing measurements based on a prediction from said model. The model is updated with said coefficient estimates. The method additionally includes iterating over the data from the database to estimate a process state, and, if one or more of the measurements is missing from the database, replacing the missing measurements based on prediction from the model. The model is updated with said process state estimate. A controller may receive the updated model and utilize the model to produce the next process input. The updated model may also be utilized to generate an estimate for a measurable process variable, wherein the estimate can be compared to an actual measurement to deter…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.