Amine compounds, resist compositions and patterning process
US6749988B2 · kind B2 · utility
35Cited by
5References
20Claims
0Family size
Assignee
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Key dates
| Filing date | Nov 28, 2001 |
| Grant date | Jun 15, 2004 |
| Priority date | — |
| Expiry date | Jul 10, 2022 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0382
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Novel amine compounds having a nitrogen-containing cyclic structure and a hydrating group such as a hydroxy, ether, ester, carbonyl, carbonate group or lactone ring are useful for use in resist compositions for preventing a resist film from thinning and also for enhancing the resolution and focus margin of resist.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.