Apparatus for preforming measurement of a dimension of a test mark for semiconductor processing
US6750952B2 · kind B2 · utility
42Cited by
23References
32Claims
0Family size
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Key dates
| Filing date | Jul 17, 2002 |
| Grant date | Jun 15, 2004 |
| Priority date | — |
| Expiry date | Jul 17, 2022 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70683
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Apparatus for performing measurement of a dimension of a test marked formed by overlapping feature imaged onto a an image forming layer of a semiconductor wafer and the calculation of the critical dimensions of the features from test mark. This is used in semiconductor processing. Also included is software configured to program a measurement device to perform the measurement and calculation of the dimension of a test mark.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.