Patent · US Expired

Exposure mask with repaired dummy structure and method of repairing an exposure mask

US6756164B2 · kind B2 · utility

3Cited by

7References

12Claims

0Family size

Assignee

Infineon Technologies AG · DE

Inventors

Torsten Franke · Munich, DE
Henning Haffner · Pawling, US
Armin Semmler · Munich, DE
Martin Verbeek · Hersbruck, DE

Key dates

Filing date	Jun 28, 2002
Grant date	Jun 29, 2004
Priority date	—
Expiry date	Dec 15, 2022

Classification

Technology area (CPC G)Physics
CPC primaryG03F1/72
WIPO fieldOptics
WIPO sectorInstruments

Abstract

An exposure mask has a phase mask and a phase-shifting dummy structure. The exposure mask can be repaired with regard to defects in the dummy structure. For that purpose, repair structures are applied on the exposure mask substrate material which have a lower phase shift compared to the dummy structures. The repair structure is preferably produced from carbon, the carbon being applied in a suitable layer thickness such that the repair structure no longer permits any transmission. In a preferred embodiment, the repair structure is arranged laterally offset with respect to the defect in the dummy structure.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.