Henning Haffner
40Patents
8h-index
61Co-inventors
74Inventor score
Filing activity: Oct 21, 1999 → Aug 21, 2017
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6421820B1 | Semiconductor device fabrication using a photomask with assist features | Physics | 249 | Expired |
| US6426269B1 | Dummy feature reduction using optical proximity effect correction | Physics | 197 | Expired |
| US6631511B2 | Generating mask layout data for simulation of lithographic processes | Physics | 40 | Expired |
| US7785946B2 | Integrated circuits and methods of design and manufacture thereof | Electricity | 19 | Active |
| US8365108B2 | Generating cut mask for double-patterning process | Physics | 16 | Active |
| US6232154A | Optimized decoupling capacitor using lithographic dummy filler | Electricity | 14 | Expired |
| US6571383B1 | Semiconductor device fabrication using a photomask designed using modeling and empirical testing | Emerging Cross-Sectional Technologies | 13 | Expired |
| US7221788B2 | Method of inspecting a mask or reticle for detecting a defect, and mask or reticle inspection system | Physics | 10 | Expired |
| US8161421B2 | Calibration and verification structures for use in optical proximity correction | Physics | 7 | Active |
| US7094674B2 | Method for production of contacts on a wafer | Electricity | 7 | Expired |
| US7947431B2 | Lithography masks and methods of manufacture thereof | Emerging Cross-Sectional Technologies | 6 | Active |
| US6353248B1 | Optimized decoupling capacitor using lithographic dummy filler | Electricity | 6 | Expired |
| US8099684B2 | Methodology of placing printing assist feature for random mask layout | Physics | 5 | Active |
| US7945869B2 | Mask and method for patterning a semiconductor wafer | Physics | 3 | Active |
| US6436585B1 | Method of using optical proximity effects to create electrically blown fuses with sub-critical dimension neck downs | Electricity | 3 | Expired |
| US6756164B2 | Exposure mask with repaired dummy structure and method of repairing an exposure mask | Physics | 3 | Expired |
| US7354684B2 | Test pattern and method of evaluating the transfer properties of a test pattern | Physics | 3 | Active |
| US8078998B2 | Integrated circuits and methods of design and manufacture thereof | Electricity | 3 | Active |
| US8039203B2 | Integrated circuits and methods of design and manufacture thereof | Emerging Cross-Sectional Technologies | 3 | Active |
| US7669173B2 | Semiconductor mask and method of making same | Physics | 3 | Active |
| US8071261B2 | Lithography masks and methods of manufacture thereof | Physics | 3 | Active |
| US8809958B2 | Integrated circuits and methods of design and manufacture thereof | Electricity | 2 | Active |
| US7304721B2 | Method for dynamically monitoring a reticle | Physics | 2 | Expired |
| US8715909B2 | Lithography systems and methods of manufacturing using thereof | Physics | 2 | Active |
| US9767244B2 | Integrated circuits and methods of design and manufacture thereof | Electricity | 1 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.