Patent · US Expired

Projection optical system, manufacturing method thereof, and projection exposure apparatus

US6757051B2 · kind B2 · utility

63Cited by
22References
58Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJun 19, 2001
Grant dateJun 29, 2004
Priority date
Expiry dateJun 19, 2021

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG03F7/70225
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

A projection optical system forms an image of an object in a first plane onto a second plane. The projection optical system has an optical element group including at least one refractive member and plural reflective members, and a plurality of lens-barrel units holding the optical element group divided into a plurality of respective groupings. The reflective members are all held by a single lens-barrel unit of the plurality of lens-barrels units.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.