Process for removing dopant ions from a substrate
US6764551B2 · kind B2 · utility
2Cited by
4References
12Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 5, 2001 |
| Grant date | Jul 20, 2004 |
| Priority date | — |
| Expiry date | Jan 29, 2022 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB08B7/00
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
A process for removing dopant ions from a semiconductor substrate includes exposing the substrate to a non-aqueous organic solvent in liquid and/or vapor form.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.