Lithographic apparatus, device manufacturing method, and device manufactured thereby
US6765712B2 · kind B2 · utility
15Cited by
7References
26Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 11, 2001 |
| Grant date | Jul 20, 2004 |
| Priority date | — |
| Expiry date | Jan 15, 2022 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70266
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A lithographic projection apparatus includes an active reflector in a radiation system providing a projection beam of radiation and/or in a projection system. The active reflector includes a body member, a reflective multilayer and at least one actuator controllable to adjust the surface figure of the reflecting multilayer, wherein the actuator exerts a substantial force component in a direction parallel to the surface figure of said reflective multilayer. The actuator may be operative to apply torques to said reflector.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.