Method for forming bottle trenches by liquid phase oxide deposition
US6767786B1 · kind B1 · utility
5Cited by
5References
13Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Apr 14, 2003 |
| Grant date | Jul 27, 2004 |
| Priority date | — |
| Expiry date | Apr 14, 2023 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10D1/047
Abstract
Method for forming bottle trenches by liquid phase oxide deposition. The method includes the steps of providing a substrate having a pad layer formed thereon, and a trench formed in a predetermined position; forming a masking layer at the bottom part of the trench; using liquid phase deposition (LPD) to form an LPD oxide layer on the sidewalls of the trench; removing the masking layer to expose the bottom part of the trench; subjecting the LPD oxide layer to annealing; and etching the bottom part of the trench not covered by the LPD oxide layer to form a bottle trench.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.