Patent · US Expired

Method for SEM measurement of topological features

US6768111B1 · kind B1 · utility

1Cited by
4References
15Claims
0Family size

Assignee

Inventors

Key dates

Filing dateSep 16, 2003
Grant dateJul 27, 2004
Priority date
Expiry dateSep 16, 2023

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG01N23/2251
  • WIPO fieldMeasurement
  • WIPO sectorInstruments

Abstract

A method of measurement of topographic features on a surface of a substrate is presented, wherein a focused beam of particles falls onto the surface of the substrate, and backscattered particles are detected with a particle detector. An opaque material is interposed between the surface and the detector, and the position of the shadow of an edge of the opaque material on the detector is recorded. The relative position of the edge and the surface of the substrate is then determined, and the topography of the surface determined as the particle beam and the substrate are moved with respect to one another.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.