Impedance matching circuit for inductively coupled plasma source
US6770836B2 · kind B2 · utility
20Cited by
6References
16Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 19, 2002 |
| Grant date | Aug 3, 2004 |
| Priority date | — |
| Expiry date | Sep 18, 2022 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05H1/46
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
An impedance matching circuit for a plasma source includes: a first network including: a first coil; and a RF power supply applying a first voltage to the first coil; and a second network including; a second coil grounded having a second voltage, the second voltage being lower than the first voltage; first and second reactive elements, one end portion of the first and second reactive elements being connected to each end portion of the second coil, respectively; and a load connected to the other end portions of the first and second reactive elements, phases at two end portions of the load being different from each other.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.