Method and apparatus for improved x-ray reflection measurement
US6771735B2 · kind B2 · utility
40Cited by
6References
31Claims
0Family size
Assignee
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Key dates
| Filing date | Nov 7, 2001 |
| Grant date | Aug 3, 2004 |
| Priority date | — |
| Expiry date | Nov 7, 2021 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N23/20
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
Thin film thickness measurement accuracy in x-ray reflectometry systems can be enhanced by minimizing scattering and beam spreading effects. An oblong x-ray beam can be produced by shaping the electron beam in an x-ray microfocus tube, or by creating a target with a metal strip having the desired beam cross section. The elongation allows the beam direction dimension to be substantially reduced, without causing overheating of the target. By blocking portions of the x-ray beam focused on the thin film and generating reflectivity curves in increments, the effects of scattering can be minimized.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.