Patent · US Expired

System for determining dry cleaning timing, method for determining dry cleaning timing, dry cleaning method, and method for manufacturing semiconductor device

US6772045B2 · kind B2 · utility

3Cited by
4References
27Claims
0Family size

Assignee

Inventors

Key dates

Filing dateAug 30, 2002
Grant dateAug 3, 2004
Priority date
Expiry dateAug 30, 2022

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10S438/905
  • WIPO fieldDigital communication
  • WIPO sectorElectrical engineering

Abstract

A system for determining dry cleaning timing, includes: a manufacturing apparatus configured to process materials assigned by a sequence of lots; an apparatus controller configured to control the manufacturing apparatus and obtaining operational conditions of the manufacturing apparatus as apparatus information; a lot information input terminal configured to obtain process conditions of one of the lots as lot information; an apparatus information storage unit configured to store the apparatus information from the apparatus controller as an apparatus information database; a lot information storage unit configured to store the lot information from the lot information input terminal as a lot information database; and a cleaning determination unit configured to determine timing to perform a dry cleaning of the manufacturing apparatus based on the apparatus information database and the lot information database.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.