Apparatus and method for fast-cycle atomic layer deposition
US6773507B2 · kind B2 · utility
99Cited by
142References
39Claims
0Family size
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Key dates
| Filing date | Aug 7, 2002 |
| Grant date | Aug 10, 2004 |
| Priority date | — |
| Expiry date | Jan 18, 2023 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T117/1008
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Method and apparatus for depositing layers by atomic layer deposition. A virtual shower curtain is established between the substrate support and chamber to minimize the volume in which the reactants are distributed. A showerhead may be used to allow closer placement of the substrate thereto, further reducing the reaction volume. Zero dead space volume valves with close placement to the chamber lid and fast cycle times also improve the cycle times of the process.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.