Method of producing a perforated mask for particle radiation

US6773854B2 · kind B2 · utility

Assignee

• Infineon Technologies AG · DE

Inventors

• Albrecht Ehrmann · Aalen, DE
• Ernst Haugeneder · Wien, AT
• Frank-Michael Kamm · Dresden, DE
• Alexander Petraschenko · Hersbruck, DE
• Stefan Schunck · Hersbruck, DE

Key dates

• Filing date: Jul 31, 2002
• Grant date: Aug 10, 2004
• Expiry date: Jan 13, 2023

Classification

• Technology area (CPC H): Electricity
• CPC primary: H01J2237/3175
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

A method for producing a perforated mask for particle radiation includes calculating values of an elasticity of adjacent cells of a mask with respect to longitudinal and shear stresses in a main plane of the mask on a model of the desired pattern of mask openings. For the respective individual cells, length and direction of all the edge sections of the openings and cross-sectional areas of the openings are determined. Therefrom, statistical parameters are derived, which are used as a variable in preselected empirical functions to determine the elasticity values of the cells analytically. By linking the elasticity values determined with deformation forces to be expected, the vector field of a distortion of the mask to be expected is calculated by FE calculation. For cutting the mask openings into a blank, a pattern is selected that represents the desired pattern with a distortion being the inverse of the previously calculated distortion.