Inline detection device for self-aligned contact defects
US6774394B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Feb 1, 2002 |
| Grant date | Aug 10, 2004 |
| Priority date | — |
| Expiry date | Feb 1, 2022 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L22/34
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
The present invention provides an inline detection device for self-aligned contact defects, formed in a semiconductor substrate, comprising: an active area, formed in the semiconductor substrate, comprised of a serpentine gate having spacers on the side, a plurality of first contact windows nested immediately between the same spacers, a plurality of first contact plugs formed in the first contact windows, and two probing pads, formed in the semiconductor substrate, comprised of a plurality of matrix gates, a second contact window exposing portions of the matrix gates, and a second contact plug formed in the second contact window.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.